Ipc g03f

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Webusing a particular method of attachment to the solid support. C40B 60/00. Apparatus specially adapted for use in combinatorial chemistry or with libraries. C40B 60/02. . … http://www.publish.ne.jp/ipc/G03F.htm

LDI光刻胶专用环氧丙烯酸树脂的组合物及制造方法_专利查询 - 企 …

WebCPC to IPC Concordance for Subclass G 03F. Printable Version [PDF] Version: 2024.02. CPC Group IPC Group dwh broward schools

Method and Apparatus for Determining Structure Parameters of ...

Web11 sep. 2024 · IPC G03F 7/20 G03F 9/00 Title A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED … WebG03F 1/00 : フォトメカニカル法による凹凸化又はパターン化された表面の製造に用いる原稿の作成[3]. G03F 1/02 : ・レリーフ状原稿作成に写真方法を用いるもの. G03F 1/04 : … Web26 mei 2024 · International Filing Date 26.05.2024 IPC G03F 7/004 C07C 43/205 C07D 307/93 C07D 321/10 C07C 69/708 Title SALT, ACID GENERATOR, RESIST … dwh business services

[특허]INSPECTION METHOD OF A PHOTOMASK AND AN …

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WebClassification of the application (IPC): G03F 7/004, G03F 7/16 Technical fields searched (IPC): G03F DOCUMENTS CONSIDERED TO BE RELEVANT CategoryA WO … Web8 apr. 2024 · 本发明涉及一种用作光刻胶的感光树脂组合物，特别涉及一种用于光刻胶的感光树脂组合物，该组合物以聚倍半硅氧烷类共聚物为成膜树脂，以二叠氮化物为感光剂， … crystal hill cmsWeb11 sep. 2024 · International Filing Date 09.11.2024 IPC G03F 7/20 G03F 9/00 Title A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED APPARATUSES Abstract Disclosed is a method for modeling measurement data over a substrate area relating to a substrate in a lithographic process. dwh catt.com

"Webg03f 7/0002 (2013.01 - ep kr); g03f 7/0048 (2013.01 - ep kr); g03f 7/027 (2013.01 - ep kr); g03f 7/0388 (2013.01 - ep kr) Designated contracting state (EPC) AL AT BE BG CH CY … " - Ipc g03f

Ipc g03f

KOKUSAI ELECTRIC CORPORATION 13 13 LAM RESEARCH …

WebThe invention discloses a cyclic scanning exposure machine, which relates to the field of optical equipment and solves the problem of low exposure efficiency of the existing … Web29 jul. 2024 · This resist pattern forming method includes: a step for directly or indirectly applying a radiation-sensitive composition to a substrate; a step for directly or indirectly applying a composition for forming an upper layer film to the resist film formed by the step for applying the radiation-sensitive composition; a step for exposing, to …

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Web30 mrt. 2024 · 본 명세서에서는 패터닝 프로세스에 대한 정정을 결정하는 방법에 관해 설명한다. 이러한 방법은, 패터닝 프로세스에 사용되는 장치의 데이터 및 계측 데이터로부터 … WebIpc: G03F0007039000. 2011-10-14: GRAP: Despatch of communication of intention to grant a patent: Free format text: ORIGINAL CODE: EPIDOSNIGR1. 2011-11-02: RIC1: …

WebIpc: G03F 7/09. 1993-11-03: 17Q: First examination report despatched: Effective date: 19930920. 1996-05-31: STAA: Information on the status of an ep patent application or … Web5 dec. 2024 · In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, …

Web8 apr. 2024 · 这种光刻胶感光树脂可利用光刻工序来加工导通孔或形成分区图案，此时，为了取得高解析度的图案，需要可在稀的碱性显像液中容易地显像，并可通过固化工序形成分子间交联结合，才可取得耐化学性、耐热性及后工序可靠性。以往的绝缘膜用正性光刻胶感光树脂主要使用由丙烯酸类粘结剂与萘醌二叠氮基化合物组合而成的材料，但此类无法承受 … Web12 feb. 2024 · 高世代面板铜制程光刻胶剥离液技术领域 [0001]本发明涉及剥离液技术领域，更具体的说是涉及一种高世代面板铜制程光刻胶 ...

Web12 feb. 2024 · 本发明公开了一种高世代面板铜制程光刻胶剥离液，包括以下质量组分：酰胺：50‑60％；醇醚：35‑45％；环胺与链胺：3‑7％；缓蚀剂：0.4％‑0.8％；润湿剂：0.1％‑0.4％。本发明经过大量的试验，创造性的发现，在剥离液中加入润湿剂，能够使高世代面板更易被水浸湿的物质，通过降低其表面张力或界面张力，使水能展开在高世代 …

Web12 mei 2013 · International Filing Date 31.05.2013 IPC G03F 7/004 C08F 212/02 G03F 7/039 H01L 21/027 Title ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND … dwh chedrauiWeb21 mrt. 2011 · IPC: G03F; G01B: Priority date: 21/03/11: Publication status: Published - 2014: Bibliographical note Patent: OCT-13-090 Applicant: ASML Netherlands B.V. … dwh-caritasWebPROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter, which is improved in development durability and contrast, and a pattern forming … dwh building servicesWebClassification of the application (IPC): G03F 7/20, G03F 1/72, G03F 1/36, G03F 1/70, H01J 37/32 Technical fields searched (IPC): G03F, H01J DOCUMENTS CONSIDERED TO … dwh chefsWebIPC 8 full level G03F 7/20 (2006.01) CPC (source: EP KR US) G03F 7/704 (2013.01 - KR); G03F 7/70458 (2013.01 - EP KR US); G03F 7/705 (2013.01 - EP KR US); G03F 7/70516 … crystal hill condominiumsWebClassification of the application (IPC): G03F 1/70, H01L 21/3065, G03F 1/36 Technical fields searched (IPC): G03F, G06F DOCUMENTS CONSIDERED TO BE RELEVANT … dwh chelfordWeb12 aug. 2024 · 1.一种光刻胶的图案化方法，包括以下步骤：将所述光刻胶涂布在基底表面，除去所述光刻胶中的有机溶剂，在所述基底表面上形成预成膜层，所述光刻胶包括有机溶剂、功能粒子5～25份、自由基淬灭剂0～2份且不为0份，所述功能粒子包括可自由基聚合型金属氧化物以及包被在所述金属氧化物表面的 ... dwhc.nl